Microstructure and adsorption characteristics of Zr–Co–RE getter films deposited using krypton as sputtering gas
نویسندگان
چکیده
The vacuum level in micro-electro-mechanical system devices needs to be achieved and maintained using non-evaporable getter film technology. Zr–Co–RE films are deposited by direct current (DC) magnetron sputtering krypton (Kr) as the gas. influence of gas pressure DC power on microstructure adsorption characteristics is investigated. at different pressures all grow a columnar shape. Films grown low Kr relatively dense have structure with fewer cracks, whereas high result uniform cluster more gaps micro-cracks. In addition, it revealed that has great performance. contain micro-cracks, which distributed uniformly. At power, not obvious. Consequently, beneficial improve Hydrogen tests carried out special system, keeping constant. highest initial speed 89 (ml/s)/cm2, obtained 4.0 Pa 300 W power. Meanwhile, under these conditions excellent stability.
منابع مشابه
Microstructure and magnetic properties of very" thin CoCr films deposited on different underlayers by if-sputtering
Very thin CoCr films deposited on different underlayers on glass disk substrates were studied by the magneto-optic Kerr effect, VSM, torque magnetometcy and TEM selected area diffraction. Square or near square perpendicular loops were obtained from Co/Ti , CoCr/Au: CoCr/AI, CoCr/C and CoCr/Si films. TEM SAD study revealed that the crystalline structure is a key factor determining the magnetic a...
متن کاملhazard evaluation of gas condensate stabilization and dehydration unit of parsian gas refinery using hazop procedures
شناسایی مخاطرات در واحد 400 پالایشگاه گاز پارسیان. در این پروزه با بکارگیری از تکنیک hazop به شناسا یی مخاطرات ، انحرافات ممکن و در صورت لزوم ارایه راهکارهای مناسب جهت افزایش ایمنی فرا یند پرداخته میگردد. شرایط عملیاتی مخاطره آمیز نظیر فشار و دمای بالا و وجود ترکیبات مختلف سمی و قابل انفجار در واحدهای پالایش گاز، ضرورت توجه به موارد ایمنی در این چنین واحدهایی را مشخص می سازد. مطالعه hazop یک ر...
Mechanical Properties and Microstructural Evolution of Ta/TaNx Double Layer Thin Films Deposited by Magnetron Sputtering
Crystalline tantalum thin films of about 500nm thickness were deposited on AISI 316L stainless steel substrate using magnetron sputtering. To investigate the nano-mechanical properties of tantalum films, deposition was performed at two temperatures (25°C and 200°C) on TaNx intermediate layer with different N2/Ar flow rate ratio from 0 to 30%. Nano-indentation was performed to obtain the mechani...
متن کاملIncrease of Saturation Magnetization of Ba Ferrite Films Deposited by Adding Xe Into Sputtering Gas Mixture
Baferrite thin films with well c-axis orientation were depositedby means of threesputtering systems and the relationships among their microstructure, magnetic characteristics and plasma parameters were discussed It was clearly confirmed that the suppression of heavy bombardment of energetic particles to the surface of the growing film was the most important for attaining the excellent crystallo...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: AIP Advances
سال: 2023
ISSN: ['2158-3226']
DOI: https://doi.org/10.1063/5.0152974